Theoretical study of tunneling current in the access region of various heterojunction field-effect transistor structures
نویسندگان
چکیده
The source resistance of a heterojunction field-effect transistor ~HFET!, whose reduction is mandatory for high-performance devices, consists of an ohmic contact resistance and an access resistance. The access region is located between the geometrical source and the geometrical source side of the gate contact. By means of a quantum-mechanical modeling program, the effect of changes in layer structure in the access region of a HFET is studied. A new heterojunction structure using a Si planar doped layer is designed to improve the linearity and reduce the access resistance by more than ten times for a specific transistor layout. Thanks to the higher sensitivity of the modeling program to structural information, the contribution of the tunneling current and the change of equilibrium as a function of temperature is investigated. © 1996 American Institute of Physics. @S0021-8979~96!00307-6#
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